The TopWave 229 is the latest addition to TOPTICA’s industrial deep UV laser line-up. With its short wavelength and an ultranarrow laser linewidth, the product provides the key features to take on an important role as excitation source in the field of deep UV Raman and deep UV fluorescence spectroscopy. It is suitable for deep UV spectroscopists looking for an easy-to-use laser that enables the user to focus on their application rather than worrying about the light source.
Excitation below 250 nm is crucial for fluorescence-free Raman, as this avoids the overlap between the spectral regions of the Raman signal and the native fluorescence. Compared to fluorescence, the Raman effect is orders of magnitude weaker, so that even minimal fluorescence is sufficient to mask Raman emission. Fluorescence spectroscopy also benefits from the 228.5 nm emission, because it allows the detection of molecules with fluorescence spectra in the range ≤270 nm, which can only be excited with shorter wavelength light.
As a CW laser system, the product avoids non-linear and saturations problems common with pulsed laser sources. With its state-of-the-art laser controller, it offers a wide range of options for operation. While laboratory users might prefer the controller’s touchscreen interface or the TOPAS PC GUI, system integrators will appreciate the comprehensive command language that enables smooth integration with their control software.
The compact footprint and low heat dissipation of the laser head allow for easy integration in space-restricted and temperature-sensitive application environments. Comfortable, hands-off operation over the system lifetime (typ 10,000 h) is enabled by fully automated optimisation routines for the internal opto-mechanics. To provide consistent, diffraction limited beam quality (M2 <1.3), the complete UV beam path is enclosed in a specially sealed compartment.
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