Kurt J Lesker NANO 36 thin film deposition system

Wednesday, 03 August, 2011 | Supplied by: John Morris Scientific Pty Ltd

Kurt J Lesker NANO 36 thin film deposition system

The Kurt J Lesker NANO 36 thin film deposition system has been designed to accommodate most thermal evaporation processes and magnetron sputtering (including: RF, DC and pulsed DC). It is suitable for entry- to mid-level users in university, industrial and government R&D laboratories.

The compact (1270 x 940 x 1727 mm) and portable system contains a range of features including: four thermal evaporation sources with film thickness monitor or control package; up to 8 wafer; magnetron sputter source option; 12 diameter x 18 glass Pyrex bell jar with implosion guard (optional St Stl box chamber); turbomolecular high-vacuum pumping system with dry backing pump; substrate heating option; manual colour touch-screen PC-based process automation.

The system is suitable for applications including photovoltaics/solar cells; SEM/TEM sample prep, organic LEDs, organic PVs, photonics/sensors, nanofabrication and medical devices.

Online: www.johnmorris.com.au
Phone: 02 9496 4200
Related Products

Waters Rheo-Impedance Spectroscopy (Rheo-IS) accessory

Waters has released an accessory for its TA Instruments Discovery Hybrid Rheometers (HR) that...

Omicron Laserage BrixXHUB Ultra high-power laser light engine

At the core of the device is the integration of up to six high-power BrixX lasers, offering a...

Waters Oasis WAX/GCB and GCB/WAX for PFAS Analysis cartridges

The dual-phase cartridges are designed to simplify and expedite the process of preparing complex...


  • All content Copyright © 2024 Westwick-Farrow Pty Ltd