Thermo Scientific Helios 5 PXL PFIB Wafer DualBeam FIB-SEM

The Thermo Scientific Helios 5 PXL PFIB Wafer DualBeam is a plasma focused ion beam scanning electron microscope, designed to reduce time to data from days to hours for inline through-stack metrology and verification of high-aspect ratio structures.

The product offers high-resolution, high-contrast imaging as well as fast, precise, large-area sample deprocessing, diagonal milling and cross-sectioning of advanced 3D semiconductor devices, such as 3D NAND and advanced memory. The easy-to-use system supports whole wafer analysis and fully automates delayering, milling and metrology in the fab, reducing wafer scrap while accelerating yield learning.

The device enables full inline metrology and process monitoring for advanced process control and excursion monitoring compliant with 300 mm fab communication protocols and standards. Users can measure and verify features of interest within complex vertical stacks and high-aspect ratio structures.

Other benefits include: nanometre-scale SEM imaging; high-volume, high-speed milling and cross-sectioning; optimised planar deprocessing for high-sensitivity materials and surface quality preservation; deprocessing of advanced metallisation layers through proprietary chemistries; precise, site-specific preparation of large-area lamellae with the optional Thermo Scientific EasyLift Nanomanipulator; and full coverage of 300 wafer handling.