Kurt J Lesker ALD 150LX atomic layer deposition system

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The Kurt J Lesker ALD 150LX atomic layer deposition system can operate as a stand-alone or fully integrated cluster tool system. It is suitable for use in nanofabrication, microelectronics, optics, MEMS, semiconductor, photovoltaics, photonics, catalysis and fuel cells, wear resistance and OLED/organic electronics applications.

The system provides full process control, integrated pumping, pressure management and gas delivery packages that can be optimised to suit a specific process.

Features include: perpendicular flow reactant delivery for short cycle times and efficient reactant utilisation; high throughput, centrally pumped for enhanced uniformity and reactant dispersion; expandable LVP, HVP precursor delivery for multiple ALD layer deposition including metals, oxides and nitride layers; substrate heating to 500°C enabling a wide range of ALD research; heated chamber walls, delivery lines and pumping lines to prevent unwanted deposition and increase precursor utilisation; up to 6″ diameter wafer (smaller substrates via adaptors); optional load lock; optional remote inductively coupled plasma source; fully enclosed framework and stand-alone electronics/control console; in-situ monitoring via standard ellipsometry ports; scalable design allowing easy expansion and cluster tool integration.