Mass flow controllers

Monday, 01 December, 2008 | Supplied by: Duff & Macintosh

Alicat Scientific has launched a line of low flow (0.5 to 50 SCCM) mass flow controllers.

The instruments are suitable for processes such as chemical vapour deposition, physical vapour deposition, thin film, sputtering and backside wafer cooling.

With internally compensated laminar flow technology, the instruments are claimed to be capable of controlling flow rates as low as 0.5 SCCM full scale, with a control range of 1-100% full scale and a control response time of less than 100 ms with 1% accuracy.

The controllers are NIST and CE certified and have more than 30 user-selectable gases and mixture calibrations, as well as a small footprint. The display allows the user to view the status of the device, change the values of the PID control loop and view several parameters including mass flow, volumetric flow and temperature.

A variety of customisable components are available, including totaliser function and fittings.


Phone: 02 9482 1411
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