The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with beam brightness and stability. Ethos is designed to deliver high-resolution imaging at low voltages combined with ion optics for nanoscale precision processing.
Features include: high-performance FE-SEM column with dual lens mode; high-throughput material processing; microsampling system; triple-beam capable; large multiport chamber and stage for various applications.
The Ethos SEM column is composed of a magnetic- and electrostatic-field compound objective lens system configured as two lens modes. High Resolution (HR) mode achieves sample observation at high resolution by immersing the sample within the magnetic field of the lens system. Field Free (FF) mode offers real-time FIB processing for high accuracy end point milling. Hyper switching between FIB irradiation and SEM imaging as fast as 10 ns offers real-time fabrication and observation views with clarity.
Phone: 02 9888 4100
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