KMLabs has introduced the QM Quantum Microscope for next-generation imaging and analysis, built on the company’s coherent extreme ultraviolet (EUV) and vacuum ultraviolet laser (VUV) sources. The modular QM platform enables high-contrast, near-surface-to-subsurface coherent imaging at the nanoscale and can be configured for EUV ultrafast spectroscopy.
The imaging and analysis solution comprises a high-powered laser amplifier source, EUV or VUV wavelength conversion, a high-efficiency beamline tailored to the user’s experiment, and imaging or other analysis endstations that can effectively cover the microscopy/spectroscopy landscape for nano-to-quantum materials.
Enabling tabletop-scale EUV microscopy, QM offers information complementary to SEM (nm-scale resolution) and AFM (surface profile) with elemental selectivity and the ability to probe dynamic processes. QM configurations can enable laboratory-based high-contrast imaging of composition and structure; study of mechanical properties of patterned films; deep understanding of materials properties; and functional characterisation of spintronic, 2D, and advanced electronic and aerospace materials.
Phone: 02 9450 1359
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