SwissLitho NanoFrazor Explore thermal Scanning Probe Lithography (tSPL) system

The NanoFrazor Explore thermal Probe Scanning Lithography (t-SPL) system can produce 2D and 3D nanostructures in a single step. The unit can operate in ambient conditions and has no requirement for high voltage. It is said to offer advantage over electron beam lithography (EBL) systems, which are typically bulky and require ultrahigh-vacuum environments with high-voltage supplies.

SwissLitho’s technology uses a sharp tip, similar to an AFM tip, which heats a localised area, resulting in decomposition and effectively machining the surface of the resist material. The tip, which has a radius better than 5 nm, is able to create a high-resolution nanopattern. The system has the ability to operate in closed-loop lithography mode. This enables the user to simultaneously pattern and measure a sample, providing instantaneous feedback on the patterning process.

The patterning depth can be controlled with nanometre accuracy, which enables direct patterning of 3D nanostructures in a single step. It also eliminates the need for subsequent imaging of a sample after patterning. Furthermore, the latest stitching and overlay methods achieve sub-5 nm accuracy without the use of artificial marker structures.

The heated tip in the lithography process does not deposit charged particles like electrons or ions into the sample. For dedicated nanoelectronic devices, this can result in good device performance. The instrument is easy to use due to a smart software architecture and user-friendly graphical user interface that simplifies many complex functions. This enables high-resolution, nanometre-sized geometries to be quickly prototyped.