Inverted materials microscope

Nikon Instruments has introduced the Eclipse MA200, an inverted materials microscope that uses integrated intelligence to automatically combine captured images with data on the applied observation settings for more comprehensive documentation. Its design allows easy access to the sample on the stage and nosepiece, while minimising the footprint size.

The instrument saves benchtop space while placing primary controls in front, making it easy to access the objective lens and sample and minimising the stress caused by long hours of operation.

The device delivers bright, high resolution and high contrast images. The 1X objective lens enables macro observation with actual field view of 25 mm, making it possible to view the whole area of an embedded metallurgical sample. It also offers a wide range of contrast methods, including episcopic brightfield, episcopic dark field, DIC, simple polarising and episcopic fluorescence.

The intelligent manual nosepiece will output the objective position and internal magnification data out to DS-L2 and NIS-Elements for automatic scale calibration. The scale size will automatically be calibrated when the objective magnification is changed.

Large image stitching is also possible through the optional stitching function in the NIS-Elements software. Additionally, by combining the Metalo software module (grain sizing and cast iron), the system will be suitable for JIS and ASTM standard compliant metallurgical analysis.